Beilstein J. Nanotechnol.2012,3, 884–892, doi:10.3762/bjnano.3.98
materials with relatively short characteristic relaxation lengths.
Keywords: magnetic point contact arrays; spinlaser; sub-10 nm colloidal lithography; Introduction
Colloidal lithography [1] is a method to reproduce patterns in a variety of natural systems and is used more and more as an efficient
nontrivial task for any patterning technique (see Introduction) and, to our knowledge, has not been demonstrated to date.
For the spin-laser device of [15], for example, the bottom electrode must be thick to serve as an efficient electron and phonon bath under high-current injection. We take that into
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Figure 1:
Tapping-mode atomic force microscopy images of a typical monolayer, with the particle diameter (and...